OVERVIEWThe IA-8 is a manually loaded SMIF pod washing system. This system is for cleaning semiconductor device containers and is built with experience advanced knowledge of the latest technology for Semiconductor equipment manufacturing.. It is suitable for pilot lines, research and development. The IA-8 can wash and dry 8 inch SMIF pods and also can…
OVERVIEWCleaning FOUPs and FOSBs is required to improve and maintain the yield of the semiconductor manufacturing process. The IF-12 can wash and dry a variety of FOUPs and FOSBs in one system without changing the set-up because of our unique chamber structure.FEATURES High through-put (compared with our previous system) Small foot print design Protection from…
OVERVIEW The Hugle SC-8 is the solution you need to clean all types of wafer carriers and boxes up to 8” in a single system. The SC-8 is a new generation semi-automatic cassette and box cleaning system. This model features energy efficient, space saving, trouble free design. Special water and air nozzles wash and dry…
OVERVIEWThe SR-EUV/200/150 is Hugle’s fully automatic cleaning system for EUV Reticle PODs, RSP-200 and RSP-150. Cleaning these pods is one of the most demanding applications for container cleaning equipment in the Semiconductor Industry. Hugle has met the challenge with innovative technology and unmatched system reliability. The EUV pod is automatically fed into the system, outer…
OVERVIEW300mm wafers have become the industry standard for semiconductor development and manufacturing. Exceptional FOUP cleaning is required for advanced products especially with the introduction of EUV lithography. Hugle Electronics has built on the solid performance of the UPC-12100 by introducing the UPC-12500. The 12500 is a fully automatic FOUP Cleaning System with excellent performance, throughput…
